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Phd Thesis: Integration and Characterization of
vor 4 Monaten
As a PhD student you will work together with our team and industry partner to transfer these technologies into existing technology nodes. Since ferroelectricity in HfO2 occurs only in a metastable orthorhombic phase, whose stability range depends on a variety of parameters, such as layer thickness, dopant content and type, layer stresses and thermal post-treatment which need to be optimized. In this work, the dependence of these process parameters on the ferroelectric properties such as remanent polarization, cycle endurance and microvariability will be investigated and correlated with physical properties of the films such as composition and crystallographic phase.
**What you will do**
- Deposition of ferroelectric HfO2 layer stack and device integration thereof
- Physical characterization of the HfO2 layers thus produced, e.g. by XRD, XPS, SEM/TEM and AFM
- Generation of ferroelectric memory devices for electrical characterization of the films in terms of reliability, polarization hysteresis and leakage current
- On-site integration support at the industry partner
- Communication with project partners and customers
- Presentation of scientific results at conferences and publications in journals
**What you bring to the table**
- Completed scientific university studies in the field of electrical engineering, physics, material sciences or comparable master's or diploma degree
- Knowledge in at least one of the following areas is advantageous: electrical/structural characterization, memory technology, ferroelectric materials
- Analytical and structured way of thinking and working combined with strong communication skills, joy of teamwork and assertiveness
- Ability to quickly familiarize yourself with new technical-scientific contexts
- Good written and spoken English as a basis for working in an international team
**What you can expect**
You want to do a doctorate? You want to plan and design your doctorate with foresight and strategy? Within the framework of our doctoral college, you will benefit from a regular exchange with other doctoral students. We support your personal and professional development with individual training measures.
We offer female scientists the opportunity to participate in our TALENTA program: a comprehensive career and development program that includes individually tailored qualification offers. You can find out more here.
We are convinced that appreciation and trust are the basis for satisfaction and motivation. We create a work-life balance through flexible working time models and the possibility of mobile working, because creative and innovative ideas can arise anywhere. We also attach great importance to intensive induction training and an open and collegial working environment. Whether sports, music or team events - we offer a wide range of opportunities to pursue our own passions together and strengthen our team spirit.
With its focus on developing key technologies that are vital for the future and enabling the commercial utilization of this work by business and industry, Fraunhofer plays a central role in the innovation process. As a pioneer and catalyst for groundbreaking developments and scientific excellence, Fraunhofer helps shape society now and in the future.
**Contact**
Ms. Isabell Zwinscher
Human Resources
Telephone: +49 (0)351 8823-1227
Mr. Dr. Konrad Seidel
Specialty Department
Telephone: +49 (0)351 2607-3059
Fraunhofer Institute for Photonic Microsystems IPMS
Requisition Number: 74131 Application Deadline: 09/26/2023
