As a key member of our Global Algorithms & Software Semiconductor Mask Solutions team, you will play a pivotal role in shaping the digital future of ZEISS. Your expertise in developing sophisticated algorithms will enable us to evaluate enormous amounts of image data in a highly efficient manner, ultimately driving the performance of our complex photomask systems.

Our high-tech measurement systems for semiconductor lithography demand extreme precision, and it's your challenge to break through the accuracy limits using algorithms. You will lead a team of experts in developing highly accurate mathematical-optical models and their numerical solutions. Your success will be measured by the maturity and value-adding algorithms you deliver.

• Master's degree in physics, computer science, engineering, or applied mathematics
• Strong knowledge in numerics for PDEs, computational lithography, optimization, or image processing
• Several years of experience in developing and managing complex algorithm projects or algorithm development groups
• Experience with classical and agile development methods
• Proficiency in MATLAB, Python, C#/C++, and HPC
• Proven ability to cooperate and motivate team members
• Strong organizational and coordination skills

As a member of our team, you will have the opportunity to work on cutting-edge projects, collaborate with experts in the field, and contribute to the development of innovative solutions. If you are passionate about algorithm development and leadership, we encourage you to apply for this exciting opportunity.